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  4. Annealing Temperature Effect on the Properties of CoCe Thin Films Prepared by Magnetron Sputtering at Si(100) and Glass Substrates
 
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Annealing Temperature Effect on the Properties of CoCe Thin Films Prepared by Magnetron Sputtering at Si(100) and Glass Substrates

Journal
Processes
Date Issued
2024-12-01
Author(s)
SHIH-HUNG LIN  
DOI
10.3390/pr12122806
URI
https://www.scopus.com/pages/publications/85213228957
https://scholars.csmu.edu.tw/handle/123456789/31500
Abstract
This study explores cobalt–cerium (Co90Ce10) thin films deposited on silicon (Si) (100) and glass substrates via direct current (DC) magnetron sputtering, with thicknesses from 10 nanometer (nm) to 50 nm. Post-deposition annealing treatments, conducted from 100 °C to 300 °C, resulted in significant changes in surface roughness, surface energy, and magnetic domain size, demonstrating the potential to tune magnetic properties via thermal processing. The films exhibited hydrophilic behavior, with thinner films showing a stronger substrate effect, crucial for surface engineering in device fabrication. Increased film thickness reduced transmittance due to photon signal inhibition and light scattering, important for optimizing optical devices. Furthermore, the reduction in sheet resistance and resistivity with increasing thickness and heat treatment highlights the significance of these parameters in optimizing the electrical properties for practical applications.
Type
journal article
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