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  4. Influences of argon plasma cleaning on the die-shear force of chip and copper/polyimide flexible substrate assembly using a non-conductive film
 
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Influences of argon plasma cleaning on the die-shear force of chip and copper/polyimide flexible substrate assembly using a non-conductive film

Journal
Journal of the Chinese Institute of Engineers, Transactions of the Chinese Institute of Engineers,Series A/Chung-kuo Kung Ch'eng Hsuch K'an
Date Issued
2017-11-17
Author(s)
YEN-HUI LIN  
CHENG-LI CHUANG  
DOI
10.1080/02533839.2017.1384329
URI
https://www.scopus.com/pages/publications/85031799764
https://scholars.csmu.edu.tw/handle/123456789/34463
Abstract
A non-conductive film (NCF) and a thermal compression process were combined to assemble a chip onto a flexible substrate. To achieve direct bonding and to enhance the adhesion of a chip on the flexible substrate with NCF, argon plasma was used to clean copper electrodes over a flexible substrate. For flexible substrates which received argon plasma cleaning, low contact angles were obtained, and gold bumps directly contacted copper electrodes to form active input/output (I/O) paths, indicating the contaminants on the flexible substrate were removed and a clean bonding surface could be achieved. Neither delamination nor porosity was observed at the bonding interface between the NCF and copper electrodes. A sound bonding interface with satisfactory die-shear force was achieved. The argon plasma cleaning led to a significant improvement of the die-shear force of a chip bonded onto the flexible substrate using NCF.
Type
journal article
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